The focused ion beam (FIB) technique is a high-resolution imaging and microfabrication technology that uses a focused beam of ions to selectively remove or deposit material at the nanoscale level. FIB instruments are typically based on a scanning electron microscope (SEM) to visualize the sample and a focused beam of gallium ions to precisely remove or deposit material.
| Network | Infrastructure | Instrument | Country | Link |
|---|---|---|---|---|
| RADIATE | CNA | 3 MeV Tandem Accelerator | ES | More details |
| e-dream | CNR | ZEISS LEO 1540 with GEMINI Column | IT | No web page yet |
| e-dream | ER-C | FEI Helios NanoLab 400S FIB-SEM | DE | More details |
| e-dream | ER-C | FEI Helios NanoLab 460F1 FIB-SEM | DE | More details |
| RADIATE | GANIL | GANIL | FR | |
| RADIATE | IBC | Helium Ion Microscopy | DE | More details |
| RADIATE | IBC | non-Ga FIB | DE | More details |
| e-dream | ICN2 | Thermo Fisher HELIOS 5UX FIB | ES | No web page yet |
| RADIATE | LT | Ion beam lines at Tandetron | CZ | More details |
| RADIATE | RBI-AF | 1 MV Tandentron and 6 MV Tandem Van de Graaff | HR |