The focused ion beam (FIB) technique is a high-resolution imaging and microfabrication technology that uses a focused beam of ions to selectively remove or deposit material at the nanoscale level. FIB instruments are typically based on a scanning electron microscope (SEM) to visualize the sample and a focused beam of gallium ions to precisely remove or deposit material.
| Network | Country | Infrastructure | Instrument | Link |
|---|---|---|---|---|
| RADIATE | ES | CNA | 3 MeV Tandem Accelerator | More details |
| FR | GANIL | GANIL | More details More details |
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| DE | IBC | Helium Ion Microscopy | More details | |
| non-Ga FIB | More details | |||
| CZ | LT | Ion beam lines at Tandetron | More details | |
| HR | RBI-AF | 1 MV Tandentron and 6 MV Tandem Van de Graaff | More details More details More details More details |
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| e-DREAM | DE | ER-C | FEI Helios NanoLab 400S FIB-SEM | More details |
| FEI Helios NanoLab 460F1 FIB-SEM | More details | |||
| ES | ICN2 | Thermo Fisher HELIOS 5UX FIB | More details |